Omron F250-UME Software Manual page 338

EC Defect
2-15-2 Extracting Edges
Upper and Lower Limits
Low contrast with background
High contrast with background
Mask Size
2-15-(5)
EC defect inspection is performed for images for which the edges have been
extracted.
Adjust the upper and lower levels for edge extracting if there is low contrast
between the measurement object and the background and to remove noise.
Set the level to which the background will be cut from the edge-extracted
image. The levels can be set between 10 and 255 (default 100:255).
Areas with a density above the lower limit will become the edge of the mea-
surement object. Refer to the following examples and adjust the upper and
lower limits.
Example: Cannot Find Edges Due to Low Contrast
Edge-extracted image
Cannot find edges
Example: To Remove Noise
Edge-extracted image
Example: Other Edges Clearly Extracted But Cannot Find Desired Mark
Edge with Stability
Edge-extracted image
The mask size function is used when searching for edges to judge edges
using peripheral information. Select how much peripheral pixel information to
use. The selections are 5
Reduce lower limit.
Increase lower limit.
Reduce upper limit.
5 (default) or 3 3.
Section 2-15
The edges of low
contrast sections also
clearly extracted.