Sirona ORTHOPHOS SL 2D Service Manual page 205

Sirona Dental Systems GmbH
Service Manual ORTHOPHOS SL
64 95 258 D3632
D3632.076.01.03.02 09.2016
7.2.1.6.1 Automatic adjustment: Ceph secondary diaphragm (standard)
NOTICE
Phantom for Ceph exposure
Risk of damage to unit
It is essential that the needle phantom is removed from the bite block
holder on the unit before a ceph exposure is taken; otherwise, the
sensor could collide with the phantom.
✔
The pan needle phantom is
unit.
✔
The ceph test phantom does
unit.
1. In the structure tree, under
secondary diaphragm"
The
displayed in the action area. The menu supports precision
adjustment and coarse adjustment (precision adjustment is pre-
selected). Perform a precision adjustment first. In most cases,
previous coarse adjustment is not necessary. [ → 170]
2. Establish readiness for exposure [ → 175].
3. Create an exposure (80kV / 14 mA; 0.6 s) [ → 175].
The adjustment values S1, S2 and S3 are automatically
determined from the exposure and entered in the text boxes of
"Adjustment of Ceph secondary diaphragm"
the
The exposure is displayed in the exposure window.
7.2 Adjustment and calibration via the calibration menu
not
in the pan bite block holder on the
not
connect to the cover of the sensor
"Ceph"
element (S010.5).
"Adjustment of Ceph secondary diaphragm"
7 Unit adjustment and calibration
"Adjustment of Ceph
, click on the
menu is
menu.
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