12 Reference Information
12.1 Chemical Resistance of PEEK
PEEK has superb chemical resistance to most organic solvents. However, it tends to swell
when in contact with trichlormethane (CHCl
tetrahydrofuran (THF). In addition, it is attacked by concentrated acids, such as, sulfuric
acid and nitric acid or a mixture of hexane, ethyl acetate, and methanol. Swelling or attack
by concentrated acids is not a problem with brief flushing procedures.
For information about the chemical resistance of PEEK, see the table.
Medium
Acetaldehyde
Acetic acid
Acetone
Ammonia
Ammonium sulphate
Amyl acetate
Amyl alcohol
Benzaldehyde
Benzene
Benzene/Benzene mixture
Benzoic acid
Borax
Bromine
Butane
Butanol
Calcium hydroxide
Carbon dioxide
Carbon tetrachloride
Chloric gas
Chlorine (liquid)
Chlorobenzene
Chloroform (trichlormethane)
Chromic acid
Citric acid
Copper sulphate
Cyclohexane
Cyclohexanol
Cyclohexanone
Diethyl ether
Diisopropyl ether
Operating Instructions
), dimethyl sulfoxide (DMSO), or
3
Concentration
Temperature
[%]
techn. pure
23
96
23
100
23
28
23
23
100
23
techn. pure
23
23
100
23
60
23
60
23
23
100
23
23
100
23
100
23
23
23
100
23
100
23
40
23
23
23
100
23
100
23
23
100
23
100
23
UltiMate 3000 Series:
NCS-3500RS and NCP-3200RS
Maximum
Resistance
Duration
(+ = yes; - = no)
(Days)
+
7
+
7
+
7
+
+
+
+
7
+
7
+
42
+
+
+
-
+
+
+
+
+
+
-
+
+
+
+
+
+
+
+
7
+
+
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