Cleaning The Repeller And The Ionization Chamber - Waters Xevo TQ-GC Overview And Maintenance Manual

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4.7.2 Cleaning the repeller and the ionization chamber

Required materials:
• Chemical-resistant, powder-free gloves
• Appropriately sized glass vessels in which to completely immerse components when cleaning.
Use only glassware not previously cleaned with surfactants.
• Cotton swabs
• HPLC-grade (or better) methanol
• HPLC-grade (or better) water
• Aluminium oxide powder
• HPLC-grade acetone
• Dichloromethane (DCM)
• 1:1 acetone/dichloromethane (DCM)
• Sonicator
• Oil-free nitrogen gas
To clean the repeller and the ionization chamber:
Warning:
To avoid personal contamination with biologically hazardous, toxic, or corrosive
materials, and to avoid spreading contamination to uncontaminated surfaces, wear clean,
chemical-resistant, powder-free gloves when performing this procedure.
Warning:
Note:
To avoid damaging the filament or filaments, do not clean them. Clean only the repeller
and the ionization chamber.
Important:
To ensure the performance of the instrument, you must regularly clean the
components. Pay particular care and attention to cleaning the CI components.
1.
Apply a fine abrasive using a cotton swab, and apply gentle pressure to remove
discoloration.
Tip:
Make the abrasive by adding a little methanol to aluminium oxide powder to form a
paste.
2.
Remove surplus abrasive by rinsing with methanol.
Tip:
If the methanol does not remove all of the abrasive, immerse the components in a
beaker of distilled water and sonicate for five minutes.
To avoid eye injury, use eye protection when performing this procedure.
April 27, 2020, 715005564 Ver. 01 (previously released as Rev. A)
Page 69

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