Sony MKS-X1115 User Manual page 153

Live production processor system
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Mix
Positive NAM
You can adjust the pattern mix using the parameters.
When mix, positive NAM, or negative NAM is selected:
Set the proportion of the sub pattern relative to the
main pattern (0.00% to 100.00%) using the [Mix
Ratio] parameter.
When morphing is selected:
Set the position of the transition where the main
pattern is 100% using the [Start] parameter, and the
position of the transition where the sub pattern is
100% using the [End] parameter.
• Set a value in the range –50.00 to 150.00. A value
of 0.00 corresponds to the start of the transition, and
a value of 100.00 corresponds to the end of the
transition.
• A negative [Start] value signifies that main and sub
pattern mixing has begun when the transition starts.
• An [End] value of greater than 100.00 signifies that
the main and sub patterns are still mixing when the
transition ends.
• If the [Start] and [End] values are the same, the
main and sub patterns are interchanged
instantaneously at a specified point in the
transition.
• If the [End] value is less than the [Start] value, the
transition progress is from the sub pattern to the
main pattern.
Dust mix
You can apply a diamond dust wipe effect to a selected
wipe pattern. The selected pattern and diamond dust wipe
pattern are mixed, so this is the same effect obtained as a
pattern mix when the diamond dust pattern is selected for
the sub pattern.
You can also apply the diamond dust wipe effect to the
pattern created by a pattern mix.
Note
When a diamond dust wipe (pattern number 274) is
selected, the dust mix effect is not applied.
Relationship between main pattern and
sub pattern
Sub patterns may not be available for some patterns,
depending on the selected main pattern.
A pattern mix cannot be configured for the following
combinations of main pattern and sub pattern.
• When the main pattern or sub pattern is a rotary wipe
• When both the main pattern and sub pattern are mosaic
wipes
• When both the main pattern and sub pattern are
random/diamond dust wipes
If the main pattern and sub pattern are in a combination
for which a pattern mix cannot be set, the sub pattern
Negative NAM
changes to pattern number 1.
Main pattern and sub pattern modifier link
It is possible to link the modifier settings for the main
pattern and sub pattern.
The following two link modes are available.
Full link mode
All modifier settings are the same for the main pattern and
sub pattern. Changing the modifiers for one pattern also
changes the modifiers for the other pattern.
Semi link mode
Only the parameter adjustments of the modifiers are
linked. The modifier enable/disable settings are not
linked.
When the parameter values of the same modifiers for the
main pattern and sub pattern are different and semi link
mode is selected, changing the value of the parameter for
one pattern also changes the value of the parameter for the
other pattern to maintain the same difference between the
two.
Note
When executing a wipe transition using a pattern mix, it
is recommended that you set the modifier link function to
full link mode. If the modifier link function is disabled or
semi link mode is selected, the desired image may not be
obtained at the start or end of the transition.
Setting a pattern mix
This section describes the M/E-1 menu as an example.
1
2
153
Open the Home > M/E-1 > Bus/Transition > Wipe >
Main Pattern menu (11109.31) and select a main
pattern.
For details, see "Selecting a wipe pattern"
(page 152).
Open the Home > M/E-1 > Bus/Transition > Wipe >
Sub Pattern menu (11109.32) and select a sub pattern.

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