Cleaning The Source Components - Waters Xevo TQ-S Operator's, Overview And Maintenance Manual

Use of the gas ballast control
To select no-gas ballast, turn the control position to 0. Doing so pumps gases
fully, achieving ultimate vacuum.
To select low-flow gas ballast, turn the control to position I. Use this position
for these purposes:
• To pump low concentrations of condensable vapors
• To decontaminate the pump
Caution:
use because it accelerates tip-seal wear. For continuous operation (to
dilute condensable vapors, for example) use gas ballast position I.
To select high-flow gas ballast, turn the control to position II. Use the position
II setting for these purposes:
• To pump high concentrations of condensable vapors
• To clear excess vapors after processing

Cleaning the source components

Clean the sample cone and cone gas nozzle when these conditions apply:
• The sample cone and cone gas nozzle are visibly fouled.
• LC and sample-related causes for decreased signal intensity have been
dismissed.
See "Cleaning the sampling cone assembly" on page
If cleaning the sample cone and cone gas nozzles fails to increase signal
sensitivity, also clean the ion block and isolation valve (see
If cleaning the ion block and isolation valve fails to increase signal sensitivity,
also clean the StepWave assembly (see
High-flow gas ballast position II is not intended for long term
4-32.
page 4-52).
Cleaning the source components
page 4-41).
4-31