Setting A Wipe; Setting A Wipe Pattern; Setting A Pattern Mix - Sony XVS-G1 User Manual

Setting a Wipe

Wipe patterns and modifiers are configured using the
menu.
This section describes the M/E-1 menu as an example.

Setting a Wipe Pattern

Selecting a wipe pattern
1
Open the Home > M/E-1 > Bus/Transition > Wipe >
Main Pattern menu (11109.31).
2
Press the button for a wipe pattern group.
Standard: Standard wipes
Enhanced: Enhanced wipes
Rotary: Rotary wipes
Masaic1 to Mosaic3: Mosaic wipes
Random/Dust: Random/diamond dust wipes
The patterns in the selected group are displayed.
3
Set the button for the target wipe pattern to the on
state.
Adjusting wipe pattern parameters
When the following patterns are selected, set the
parameters.
Enhanced wipe pattern number 49 (polygon
wipe)
No. Parameter Adjustment
1 No. Number of corners
2 Star Rate Sharpness of the corner
a) A value of –100.00 completely replaces the corner with a rounded arc,
and a value of +100.00 the corners are in the most pointed state.
Mosaic wipe pattern numbers 200 to 203, 206 to
213, 224 to 247, 250 to 257, 260 to 269
No. Parameter Adjustment
1 H Tile No. Number of tiles horizontally
2 V Tile No. Number of tiles vertically
Mosaic wipe pattern numbers 220 to 223
(karaoke wipe)
No. Parameter
1 Start
2 Row No.
3 Phase
a) At –100.00, tiles appear from the top edge or left edge of the screen; at
+100.00, tiles appear from the bottom edge or right edge of the screen.
b) At –100.00, tiles in all rows appear simultaneously; at +100.00, tiles
appear in the next row after the tiles in the previous row are completely
displayed.
Random wipe pattern number 273
No. Parameter
1 H Size
2 V Size
3 Volatility
Diamond dust wipe pattern number 274
No. Parameter
1 H Size
2 V Size
3 Flash Rate

Setting a Pattern Mix

Pattern mix
You can create a new pattern by mixing two patterns
(main and sub).
The following four types of pattern mix are available.
Note
In an independent key transition, a pattern mix cannot be
a)
used.
Pattern mix
Mix
Positive NAM
(+ NAM)
Negative NAM
(– NAM)
Morphing
149
Adjustment
a)
Start position of tiles
Number of rows of tiles
Phase step to next row
Adjustment
Tile width
Tile height
Rate of tile generation
Adjustment
Particle width
Particle height
Rate of generation of particles
Description
The effect of the sub pattern is added to
the main pattern, modifying the outline or
nature of the main pattern.
Creates a pattern with an outline
comprising the sub pattern
superimposed on the main pattern.
Creates a pattern with an outline
comprising the overlap of the sub pattern
and main pattern.
As a transition progresses, the pattern
changes. It morphs from the main
pattern, through a mix of main and sub,
to the sub pattern.
b)