Pitch Bend Range; Portamento/Attack; Portamento & Attack - ESI ESI2000 Operation Manual

Digital sampling system
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7. Pitch Bend
Range
8. Portamento
& Attack
184
ESI Operation Manual
This submodule adjusts the pitch wheel range from ± 0 to ± 12 semi-
tones.
1. Activate Preset Definition module.
2. Select Pitch Bend Range (7).
3. Select the desired pitch bend range.

PITCH BEND RANGE

Select a Pitch Range
4. Press ENTER to exit the submodule. The ESI returns to the
Module Identifier.
This submodule contains two completely unrelated functions:
• Portamento is a smooth gliding of pitch from note to note rather
than the normal instantaneous change in pitch. Portamento affects
all zones in the preset, but can be adjusted separately for the
primary and secondary layers. Values are entered in number of
seconds per octave from the last key to the current key. Portamento
glides at a linear rate with a range programmable from 0.0 seconds
(Off) to 32 seconds/octave.
• Attack Trajectory defines the attack curve of the ESI envelope
generators. There are two selectable slopes: Linear or Logarithmic
which affect all zones in the layer. A logarithmic attack rises quickly,
then levels off as it approaches maximum level. Logarithmic mode
works well for sounds with percussive attacks, while Linear mode
tends to work better on sounds with slow attacks.
1. Activate Preset Definition module.
2. Select Submodule Portamento/Attack (9).
3. Select the desired portamento rate for the primary and second-
ary layers.
±12
Semitones

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