To Clean The Ion Source - Agilent Technologies 7200 Operation Manual

Accurate-mass quadrupole time-of-flight gc/ms system
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To Clean the Ion Source

Frequency of cleaning
Because the CI ion source operates at much higher pressures than the EI ion
source, it will probably require more frequent cleaning than the EI ion source.
Cleaning of the source is not a scheduled maintenance procedure. The source
should be cleaned whenever there are performance anomalies that are
associated with a dirty ion source. See the 7200 Q-TOF GC/MS
Troubleshooting and Maintenance Manual for symptoms that indicate a dirty
ion source.
Visual appearance is not an accurate guide to cleanliness of the CI ion
source. The CI ion source can show little or no discoloration yet still need
cleaning. Let analytical performance be your guide.
Materials needed
• Abrasive paper (5061-5896)
• Alumina abrasive powder (8660-0791)
• Aluminum foil, clean
• Cloths, clean (05980-60051)
• Cotton swabs (5080-5400)
• Glass beakers, 500 mL
• Gloves, clean, lint-free
• Solvents
• Ultrasonic bath
7200 Accurate-Mass QTOF Operation Manual
Large (8650-0030)
Small (8650-0029)
Acetone, reagent grade
Methanol, reagent grade
Methylene chloride, reagent grade
General Maintenance
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