Safety; Intended Use - Zeiss GeminiSEM Series Instruction Manual

2 Safety | 2.1 Intended Use

2 Safety

This chapter contains general requirements for safe working practices. Any person using the Mi-
croscope System or commissioned with installation or maintenance must read and observe these
general safety instructions. Knowledge on basic safety instructions and requirements is a precon-
dition for safe and fault-free operation. Operational safety of the supplied Microscope System is
only ensured if it is operated according to its intended use.
If any work is associated with residual risks, this is mentioned in the relevant parts of this docu-
ment in a specific note. When components must be handled with special caution, they are
marked with a warning label. These warnings must always be observed.

2.1 Intended Use

The microscope has been designed to generate an image or to analyze appropriate specimens,
which is achieved by scanning a focused electron beam across the specimen (SEM Imaging).
In addition to microscopic examination, the microscope also allows for the modification of appro-
priate specimens. For these purposes, the specimen is placed in the evacuated specimen chamber.
The microscope has been designed for the following applications:
§
§
In combination with a gas injection system option, the microscope has been designed for the fol-
lowing applications:
§
§
Info
Not for therapeutic, treatment or medical diagnostic evidence.
Info
Not all products are available in every country. Contact your local ZEISS representative for
more information.
SmartSEM The SmartSEM software is intended for the operation of scanning electron microscopes (SEMs).
Software
The SmartSEM software has to be run exclusively on a personal computer delivered by ZEISS. Any
other applications are not allowed.
Regarding the operation of the microscope, the following regulations must be met:
§
10
Imaging
Image generation and specimen analysis can be performed by means of a focused electron
beam that is scanned across the specimen.
This application allows for the analysis of surface structures and near-surface structures of ap-
propriate specimens.
Analytics
Elemental analysis with optional EDS spectroscopy at the focused electron beam position.
Crystal structure and orientation with optional EBSD detectors.
Gas-assisted deposition
A process gas in combination with a focused electron beam can be used to deposit material
onto the specimen surface.
Gas-assisted etching
This application enables an accelerated material removal by a focused electron beam in com-
bination with process gas.
Only operate the microscope according to the operating conditions after correct installation
by a ZEISS service representative.
Instruction Manual ZEISS GeminiSEM series | en-US | Rev. 2 | 349500-8138-000
ZEISS