Configuration Parameters - Agilent Technologies 7697A Advanced Operation Manual

Configuration Parameters

Advanced Operation
Depending on the installed hardware, the HS provides the
following configuration parameters:
Vial Gas type: Select the gas type used for vial pressurization,
helium or nitrogen.
Loop volume (mL): Set the size of the sample loop. Press
[Mode/Type] to choose from a predefined list of standard
Agilent sample loop sizes. If using a custom loop size, enter
the size, in mL, directly and press [Enter].
Carrier Gas type: Available only if the optional EPC carrier gas
module is installed. Select the gas type used for the carrier
gas.
Carrier: If the optional 7697A Carrier Gas EPC Module
Accessory is not installed, the display reads GC Control, and
no further setpoints are available. In this case, the GC
carrier gas is plumbed to the HS, so that the GC controls
carrier gas flow. If the optional EPC module is installed,
configure the carrier gas control mode. Press [Mode/Type] to
select. See "Configuring Carrier Gas
Gas Saver: (Requires optional EPC module) If in HS Control
mode, the Gas Saver parameter appears. After the injection
cycle, the HS can reduce the additive carrier gas flow in
order to reduce gas consumption. Enter the desired reduced
flow rate, in mL/min, or press [Off/No] to disable and keep
the flow rate constant at the injection level. In general,
maintain sufficient flow to keep the sampling system clean.
If using HS control of carrier gas flow, enter the GC column
dimensions. The HS can only calculate flow rates for simple
columns. It cannot calculate flow rates through complex
columns, such as an Agilent 7890A GC set up for
backflushing, or which uses LTM columns or flow splitters.
Column Length (m): Enter the column length, in meters. Use
the current actual length if the column has been trimmed
significantly.
Column Diameter (u): Enter the nominal column film thickness,
in micrometers (µm).
Col Film thickness (u): Enter the column film thickness, in
micrometers (µm).
Configuration
Control".
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