Xenetech Duo 1218 Installation & Table Manual
SAFETY INFORMATION
The Xenetech Duo 1218 Engraving System was designed to meet all CDRH Class II laser safety requirements. It
utilizes an infrared laser as well as two laser diode modules.
The infrared laser is invisible to the naked eye and is used for the actual lasing of material. For your safety, the
engraver is designed so that the infrared laser will not fire when the lid is open. To prevent laser radiation from
entering the eye, do not view direct or reflected laser energy. Never view scattered laser reflections from
metallic surfaces. Laser radiation can be reflected from these surfaces even when the surface is darkened. Direct
or diffuse laser radiation can inflict severe corneal injuries leading to permanent eye damage or blindness.
The laser diode module is red in color and visible to the naked eye. The Xenetech Duo 1218 Engraving System is
equipped with two modules. The first is used as a locator for the infrared laser. This diode can be seen on the
worktable. The second diode module is used as part of the auto focus. Both of these laser modules emit radiation
that is visible and harmful to the human eye. Care should be taken not look directly into the laser emitting
aperture. Direct viewing of laser diode emission at close range may cause eye damage. The clear acrylic window is
specifically designed keep the operator safe from the effects of the diode modules while still allowing for safe and
easy viewing of the worktable.
The Xenetech Duo 1218 Engraving System was built with operator safety in mind. As shipped, this machine is a
Class II laser system. This is primarily due to the on board interlock system. When the lid is raised the infrared
laser is disabled and will be unable to fire. To further protect the operator, any and all movements of the system
are immediately stopped should the lid be raised. Movement speeds are also reduced while using the directional
arrows to move the motion system with the lid open. This is done to further protect the operator from injury. The
Xenetech Duo 1218 Engraving System is also equipped with an emergency mushroom stop which when pressed
disables all power to the system.
As materials are being engraved, they will emit vapors, fumes, and particles that can be harmful to the operator
and/or those in close range. Therefore, OSHA requires that any and all vapors from laser systems be exhausted.
This type of an exhaust system must be installed and operational prior to use of the engraving system. As a
standard, our systems require a 400 CFM minimum of total air flow @ 6" of water, 425m cubed/hour @ 1.5 KPA,
at the exhaust plenum. It is required that the MSDS (material safety data sheet) be readily available for each type
of material being used in the system. For more detailed information on exhaust see Appendix A.
Your new Xenetech laser engraver is an important part of your business. To keep this system running at peak
performance, there are certain environmental conditions that you will need to meet. The temperature in the work
area should range between 60°F - 80°F (15°C - 27°C) with the humidity kept to a minimum. Excessive humidity
and/or high temperatures in the work area will cause condensation which can over time corrode metal parts
and/or short electronic components.
The Xenetech Duo 1218 Engraving System must have adequate ventilation on all four sides to keep the system
cool. A minimum of 6" of space is required from all sides including the top. The upper and lower back of the
system has been outfitted with ventilation holes and fans mounted inside. This ensures that warm air is forced out
of the system and cool dry air is allowed to enter. Constricting this airflow can cause damage to electronic parts by
overheating the controller and/or the laser tube.
The electronic components are sensitive to outside electronic noise. In order to eliminate this noise, the system
needs to be on its own dedicated circuit. This will make certain that these components can run without any type
of interference from other electronic
equipment.
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