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3 Neuropixels Hardware Description
3.1 Probe
The Neuropixels 1.0 probe (Figure 3) is a fully-integrated silicon CMOS ASIC with on-chip circuitry for
signal conditioning and digitization. The probe features 960 low-impedance TiN recording sites densely
tiled along a thin, 10 mm-long, straight shank. The 384 parallel, configurable, low-noise recording
channels integrated in the base enable simultaneous, dual-band recording of hundreds of neurons. The
electrodes are arranged in a checkerboard layout. Additional specifications are provided in Table 1,
Table 2 and Table 3.
ELECTRODES
NUMBER
PATTERN
PITCH
MATERIAL
SIZE
IMPEDANCE
SELECTIVITY
SHANK PROPERTIES AND MATERIALS
NUMBER
WIDTH
LENGTH
THICKNESS
BENDING
TIP LENGTH
TIP SHAPE
TIP ANGLE
FRONTSIDE MATERIAL
BACKSIDE MATERIAL
SIDEWALL MATERIALS
RECORDING CHANNELS AND DIGITAL INTERFACE
NUMBER
AP BANDWIDTH
LFP BANDWIDTH
AP INPUT-REFERRED NOISE
LFP INPUT-REFERRED NOISE
AP SAMPLING FREQUENCY
LFP SAMPLING FREQUENCY
DIFFERENTIAL GAINS
CROSSTALK
INPUT VOLTAGE RANGE
ADC RESOLUTION
DATA RATE
POWER CONSUMPTION
SHANK HEATING
9
Process corner
NEUROPIXELS 1.0 USER MANUAL V1.0.5
Table 1: Electrode specifications
960
Checkerboard
16 µm (column), 20 µm (row) (see
Porous TiN
12 12 µm
~150 kΩ (at 1 kHz in PBS)
Local switch under each electrode
Table 2: Shank specifications
1
70 µm
10 mm
24 µm
≤100 µm (base to tip)
175 µm
Chisel
~20º
Silicon nitride (Si
Silicon dioxide (SiO
Silicon (Si), silicon dioxide (SiO
Table 3: Recording channel specifications
384 (dual-band)
0.3-10 kHz
0.5-500 Hz
5.9 µV
rms
9.2 µV
rms
30 kHz
2.5 kHz
50-3000 (8 values)
≤0.13% (at 1 kHz; typical)
±5 mV
pp
10 bits
163.8 Mb/s
~15 mW (in recording mode; typical)
<1°C (in the brain)
Figure 3
)
N
)
3
4
)
2
)
2
(typical
)
9
(typical)
11
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