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Summary of Contents for AST Peva-450I
- Page 1 NANOSYSTEM FABRICATION FACILITY (NFF), HKUST Standard Operating Manual ___________________________________________________________ AST Peva-450I E-Beam Evaporation System Version 1.0 Page 1 of 18...
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Page 2: Table Of Contents
2.2 Available Deposition Materials 2.3 Performance of the AST Peva-450I 3. Contact List and How to Become a Qualified User 3.1 Emergency Responses and Communications 3.2 Training to Become a Qualified AST Peva-450I User 4. Operating Procedures 4.1 System Description 4.2 Safety Warnings 4.3 Operation Rules... -
Page 3: Picture And Location
Fig 1: AST Peva-450I E-Beam Evaporation System This tool is located at NFF Enterprise Center Cleanroom Room 4162 2. Process Capabilities 2.1 Cleanliness Standard AST Peva-450I E-Beam Evaporation System is “Non-Standard” equipment for metal evaporation process use. Version 1.0 ge 3 of 18... -
Page 4: Available Deposition Materials
AST Peva-450I: Al, Ti, Ni and Au NOTE: Consult a NFF EC staff member prior to do new materials other than above listed materials. Hazardous or Radioactive materials are not allowed to be deposited in AST Peva-450I. 2.3 Performance of the AST Peva-450I E-Beam Evaporation System What the AST Peva-450I CAN do It can provide thin films (≤3000A thick) of various metal and semi-conductors... -
Page 5: Contact List And How To Become A Qualified User
NFF Phase 2 Technician: Mr. Wilson Pui Keung YIP 2358-7894 3.2 Training to Become a Qualified AST Peva-450I User Please follow the procedure below to become a qualified user of the AST Peva-450I. 1. Read all materials on the NFF website concerning the AST Peva-450I. - Page 6 & monitoring, and electron-gun control. AST Peva-450I has three control consoles: 1. Master console, Touch Screen Panel – AST Peva-450I Touch Screen Panel on the front side. 2. MAXTEK MDC-360C Deposition Controller - in the middle side, with a backlit LCD screen.
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Page 7: Safety Warnings
NANOSYSTEM FABRICATION FACILITY (NFF), HKUST Fig 3: MAXTEK MDC-360C Deposition Controller Fig 4: TELEMARK TT-3 High Voltage DC Power Supply 4.2 Safety Warnings This equipment can cause injury if not used in a cautious manner. Version 1.0 ge 7 of 18... -
Page 8: Operation Rules
NANOSYSTEM FABRICATION FACILITY (NFF), HKUST 1. The operator can inhale particles while handling the chamber and is advised to cover the mouth or wear a protective respirator mask with fine filter. 2. The system can also be easily damaged if the electron beam is misplaced or is allowed to drift out of position. -
Page 9: Status Checks
NANOSYSTEM FABRICATION FACILITY (NFF), HKUST controller, unless the system was recently used. (Chamber ion gauge reading is found on the Vacuum Gauge Controller.) 3. The cryopump temperature is 12K or less. 4. The chamber temperature is 20°C or less (reading is found on touch screen panel) 5. -
Page 10: Inspecting The Chamber Before Use
NANOSYSTEM FABRICATION FACILITY (NFF), HKUST 4.7 Inspecting the chamber before use 1. Inspect the planetary for any “real” wafers belonging to other users. If any are found, keep them in a labeled box. 2. Press “SH1” button on touch screen panel for shutter open. 3. -
Page 11: Load Wafers
NANOSYSTEM FABRICATION FACILITY (NFF), HKUST 11. Press “ABORT” button and replace a new crystal 12. Press “RESET” for verify crystal health is achieved to 98-99% Single Vacuum Chamber Source Material Correct Crucible 4.8 Load wafers 1. Load samples on to wafer holders or wafers face down on the planetary. The outer circle of planetary is recommended for better uniformity. -
Page 12: Deposition
NANOSYSTEM FABRICATION FACILITY (NFF), HKUST 10-20 seconds. b. Wait for the pressure to drop to the crossover pressure, i.e. for the cryopump to take over at about 150 mTorr. This will take 5 minutes 4. Typically around one hour for the chamber to pump down to about 9.0e-7 Torr or below. - Page 13 NANOSYSTEM FABRICATION FACILITY (NFF), HKUST On TELEMARK TT-3 control console: 10. Power “ON” the E-GUN PWR breaker for TT-3 supply. 11. Press TELEMARK TT-3 power supply, Main Power breaker “ON”. 12. Wait 5 minutes for (cut back) fans to spin up and stop flashing. On TELEMARK sweep power supply: 13.
- Page 14 NANOSYSTEM FABRICATION FACILITY (NFF), HKUST NUMBER” of MAXTEK MDC-360C Deposition Controller. 23. Press “LOAD” for recipe load. 24. Press “BACK” button to return “Menu” page. 25. Select “PROCESS” button to return “Process” page. 26. Check that the base pressure is about 3.0e-6 Torr or below. Record the pump down time, pressure and your deposition thickness in the logsheet.
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Page 15: Venting And Unloading
NANOSYSTEM FABRICATION FACILITY (NFF), HKUST 37. Rotate to the new crucible. Follow instructions starting at Step 1 in the “Deposition” section. 38. Selected correct crucible, it may take a moment to rotate. See position/material list posted on E-Gun Pocket Control page. 39. If finish the process, make sure wait at least 10 minutes for all materials firstly, this cools the targets before venting, which prevents oxidizing them. -
Page 16: Pump Down And Shutdown
NANOSYSTEM FABRICATION FACILITY (NFF), HKUST NFF Machine Reservation System. Place sign “EMPTY” on the machine. 4.12 Pump down and shutdown 1. When finish samples unloading, close the chamber door and it will automatically start to pump down. 2. DON’T GO AWAY YET! 3. Monitor the pump down to be sure the chamber door was correctly closed: a. -
Page 17: Appendix
NANOSYSTEM FABRICATION FACILITY (NFF), HKUST Appendix Touch Screen Panel – Start, Stop and Touch Screen Panel – Process Number Vent buttons Selection Touch Screen Panel – E-GUN Pocket MAIN PWR, E-GUN Control HEATING PWR Breakers MDC360C – Deposition Rate, Power, MDC-360C – Alpha and Number Thickness Process Time... - Page 18 NANOSYSTEM FABRICATION FACILITY (NFF), HKUST TT-3 Control – Interlocks TT-3 Control – XY Sweep (Long and Lat) MDC-360C – Main Menu MDC-360C – Select Process MDC-360C – Material and Thickness MDC-360C – Display, e.g. Deposition Input Rate, Power, Thickness, etc… Version 1.0 ge 18 of 18...
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