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Karl Suss MA6 Operating Manual page 8

Mask aligner nano fabrication unit
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e. GRAB IMAGE key (option). First keystroke grabs the
mask image. The objectives move to the wafer focus
plane (TOP/BOTTOM key LED off). The motor control of
the microscope manipulator is disabled. Second
keystroke GRAB IMAGE key deletes stored image and
enables the manipulator again.
5. Load Wafer
a. After grab image the machine informs you: "ready for
load... BSA image stored". Press LOAD key to start this
procedure. Load wafer onto chuck and push slide into the
machine as prompted on the display.
b. Press ENTER key.
c. WEC starts automatically. After WEC the wafer will move
to the alignment gap.
6. Wafer Alignment
a. Adjust the left/right objective image with the BOTTOM
SUBSTRATE LEFT/RIGHT regulators. Correct
illumination if necessary.
b. Use joysticks for STG-X-Y-Θ-MOVEMENT. Align the
wafer alignment marks central symmetrical to the mask
alignment marks.
7. Exposure
a. Hit EXPOSURE key.
b. After finishing the wafer chuck moves down for unload the
exposed wafer.
8. Unload Mask
a. Hit the CHANGE MASK key and the mask holder will be
released. Pull the mask holder out, flip it by 180° and
store it on the tray to your left.
b. Hit ENTER to switch the mask vacuum off.
Zx

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