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Süss MJB4 Mask Aligner User Manual
Version of 8.10.2016. Get the latest one at
1. Introduction
This user manual explains how to operate the
Süss MJB4 mask-aligner.
setup on MJB4: Intensity = 20mW/cm
(365nm) illumination.
2. Login & System Initialization
• Login on "SussMicroTec MJB4 ..." with CAE on
zone 13 accounting computer.
• Check if the main power switch is turned on. If
not, turn it on.
• Before starting with the machine, users should
check that the mercury (Hg) lamp is on. Note
that the lamp will be automatically turned off 45
minutes after the last user logs out.
• Check the lamp power supply (CIC):
If the lamp is on, CP button LED will be on
and you will be able to read light intensity
(0.0) and lamp power values. Continue to
the next section.
If the lamp is off, the CIC power supply will
be either off or show "Standby". If the touch
panel displays "start maschine with
ON/OFF button", then press the ON/OFF
button on the left front panel. The CIC will
turn on.
EPFL Swiss Institute of Technology Lausanne
CMi
Center of MicroNanoTechnology
http://cmi.epfl.ch/photo/files/MJB4/MJB4.std.manual.pdf
Default illumination
2
, i-line
Then use the following sequence to start
the lamp:
Display Standby  Press "On".
Display Ready  Press "CP".
Display Start  Press "Start".
The display will show blinking "cold".
at least 10 minutes before exposure to
make sure the lamp temperature is stable!
• Reset wafer & chuck positioning/travel range by
adjusting the following :
 Center position for x-axis (knob to 10)
 Center position for y-axis (knob to 10)
 Center position for θ angle
 Chuck rotation at "zero"
x-axis
θ-axis
Page 1
chuck rotation
Wait
y-axis
θ-axis

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Summary of Contents for SUSS MJB4

  • Page 1 Then use the following sequence to start the lamp: 2. Login & System Initialization Display Standby  Press “On”. • Login on “SussMicroTec MJB4 …” with CAE on Display Ready  Press “CP”. zone 13 accounting computer. Display Start  Press “Start”.
  • Page 2 • To perform split-exposure, change the “Exposure cycles” parameter to any values higher than 1. “Wait time” parameter will show • On the MJB4 touchscreen, go in the “Main up below. Menu” section. Press «Mask vacuum is off» to • Once the recipe parameters are set, press the turn on vacuum clamping.
  • Page 3 EPFL Swiss Institute of Technology Lausanne Page 3 Center of MicroNanoTechnology • Rotate WEC knob down (to the right) for • At this point, press “WEC settings” on the adequate wafer to mask clearance. Position touchscreen and wait for the message “Close should be “0”...
  • Page 4 Top microscope controls: 6. Alignment & Exposure • Once the WEC procedure is done, the MJB4 is ready for alignment & exposure. Load the wafer in contact with the three positioning pins, and push the slide at the back of the machine.
  • Page 5 • When alignment is done, move the wafer back in contact using the alignment gap lever. • On the MJB4 touchscreen, pressing “Alignment check” will perform the selected contact procedure (hard, soft). If alignment is good, move on with “Exposure”.