Amtech TEMPRESS Manuals

Amtech TEMPRESS Manuals

Manuals and User Guides for Amtech TEMPRESS. We have 1 Amtech TEMPRESS manual available for free PDF download: Manual

Amtech TEMPRESS Manual

Amtech TEMPRESS Manual (91 pages)

Brand: Amtech | Category: Industrial Equipment | Size: 1 MB

Table of Contents

Table of Contents
3
Preface
7
Tempress Documentation Set
7
User Definition
8
Notes, Cautions and Warnings
9
Contents Description
10
Revision History
10
Introduction
11
General
11
Process Engineer Area Description
12
Safety
13
Emergency off (EMO)
13
Alarm Signals
13
Buzzer / LED
13
Touchscreen
13
Light Tower
14
TSC Alarm Menu
14
Light Tower Signal Description
14
Toxic Material
16
Safety Measures
16
Process Setup and Acceptance
17
Process Recipe Setup Procedure
17
Introduction
17
Steps to a Process Recipe
17
Recommended Command Sequence
18
Modifying the Default Tempress Recipe
19
Process Recipe Startup and Fine-Tuning
20
Introduction
20
Prerequisites
20
Initial Settings
20
Further Fine-Tuning
21
Alarm Handling with Branch and Abort Commands
22
Introduction
22
Do Nothing with an Alarms
22
Handling Alarms with the Branch Command
22
Handling Alarms with the Abort Command
23
Recipe Example: LPCVD Nitride Abort Recipe
24
Process Acceptance Conditions
26
Introduction
26
Default Process Test Conditions
29
Process Description
35
Nitride from NH and Sih Cl
36
Basic Configuration
36
Description
36
Process Result Indication
37
Startup Parameters for Processing
37
Recommended Cleaning Interval
38
Gas Schematic Example: LPCVD Siliconnitride
39
Recipe Example: LPCVD Siliconnitride from Sih
40
Cl 2 and
40
Troubleshooting a Standard-Nitride Process
43
NH 4 Cl Vapor Pressure Curve
44
Flat Polycrystalline si from Sih
46
Basic Configuration
46
Description
46
Process Result Indication
47
Startup Parameters for Processing
47
Recommended Cleaning Interval
47
Gas Schematic Example: LPCVD Flat Poly
49
Recipe Example: LPCVD Flat Poly-Silicon from Sih
50
Troubleshooting a Flat Poly Process
53
Silicondioxide (LTO Sio ) from Sih and O
54
Basic Configuration
54
Description
54
Startup Parameters for Processing
55
Recommended Cleaning Interval
55
Process Result Indication
56
Gas Schematic Example: LPCVD LTO
57
Recipe Example: LPCVD Silicondioxide from LTO Sih
58
And O
58
Troubleshooting an LTO Process
61
Operation Instructions
62
Load or Unload Process Wafers
62
Load Process Wafers
62
Unload Wafers
62
Login TSC-2
63
Tsc-2
63
Selecting a New Process Recipe
64
Touchscreen
64
Start/Continue a New Process Recipe
67
Touchscreen
67
Stop a Running Process Recipe
69
Touchscreen
69
Abort a Running Process Recipe
71
Touchscreen
71
Edit 'Variable Process Command
73
Touchscreen
73
Clear Alarms
76
Required Action
76
Touchscreen
76
Write/Edit Process Recipe
78
Touchscreen
78
5.10 Edit Graphical Image
81
Touchscreen
81
Tsc-2
88
5.11 Logging Process Data
88
TSC-2 (Only)
88

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