Mitsubishi STERAPORE 5700 Series Instruction Manual page 24

Chapter 3 Chemical Cleaning
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Chemical Soak Cleaning
WAR NI NG
After lifting the module, rinse it under running water and remove any adhered sludge before
immersing it. Do not use a high pressure washer to clean elements as it may damage the
membrane.
Do not stand underneath the modules when they are being lifted.
Take measures to prevent wastewater used to clean modules and elements from being
discharged outside of the premises. This wastewater should normally be returned to the raw
water or aeration tank.
Dispose of chemical solutions used in chemical soak cleaning appropriately in accordance with
laws and regulations. Dispose of NaClO wastewater after reducing it with sodium thiosulfate.
Dispose of acid wastewater after neutralizing it with sodium hydroxide.
If NaClO and acid are mixed poisonous chlorine gas is released, which is very dangerous. If
NaClO cleaning and acid cleaning are performed consecutively, thoroughly wash the elements,
attached equipment, and tanks with water between these cleaning processes.
C AUT IO N
Do not allow sludge and the like to contaminate the inside of the suction line during chemical
soak cleaning. Disassemble the connection between the suction hose and the suction pipe after
cleaning it with water and block its opening with plastic bags, tape, etc. If the suction line is
contaminated, the quality of the water (number of coliform group bacteria, turbidity etc) will
deteriorate. In this case, the system must be decontaminated.
Activate the permeate pump after activating the membrane scour blower when resuming
operation.
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STERAPORE 5700 Series (FF) Instruction Manual