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Filmetrics F54 Thin Film Mapping Analyzer User Manual...
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WARNINGS DO NOT TOUCH/BEND THE FIBERS KEEP HANDS AWAY (high speed stage)
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WARNINGS DO NOT TOUCH/SCRATCH: AVOID SAMPLE CRASH: stage reference & background mirror Measurement objectives...
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Turn the light source on Tool usually always ON...
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Start the FILMapper software Stage initializes without warnings: KEEP HANDS AWAY!
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Move the stage to Load position RISK OF DAMAGING THE OPTICS: Do not load with stage under the objective!
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Sample loading: good practice OK (stage at 0,100) NO EXCHANGE UNDER OBJECTIVE!
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Choose a Recipe and Edit it From Wafer Map tab: From Measurement tab: (Under Thickness, n, k, r )
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Pick a Recipe • CMi folder: standard recipes (DO NOT MODIFY) • Users folder: custom recipes...
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Define the stack (Film Stack tab) • Choose the units (µm, nm, Å) • Define substrate/film(s)/medium • Input expected thickness (nominal ± range), tick to measure (enable fit) • -> Move to Analysis Options...
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Specify Analysis Options • Limit the Wavelength Range if appropriate • Adjust moving-average Smoothing to denoise the spectrum (use >=1000um to disable) • Change Method to Exact for stacks and/or thickness <150nm -> Move to Wafer Map...
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Choose a Wafer Map • Modify measurement configuration (sample size, number of points, exclusion, …) • OK to limit autofocus in center for the sake of speed -> Move to Acquisition Settings Advanced options (including Deskew) under Wafer Map tab: Edit -> Map Pattern…...
Acquisition settings • Enable/disable Autofocus • Available methods are Goodness Of Fit, Max of reflectometer signal, and Image-based focus • Save As to create a new recipe (DO NOT OVERWRITE CMi ones) -> Acquire a Baseline (optional) and perform a Measurement...
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Objective and Baseline • Select the objective matching the current configuration (IMPORTANT!) • Optional: take a Baseline measurement (lamp warm-up time ~5min)
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Objectives • 5x -red ring (spot size 50µm) • 15x -violet ring (spot size 17µm)
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Baseline procedure To move the stage (when prompted) 1. Load your sample 2. Acquire sample reflectance 3. Unload sample and load reference standard (Si) 4. Acquire reference standard reflectance Height for best autofocus on 525µm-thick wafers 5. Let the machine acquire the background (45°...
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Baseline calibration sample for SiO2 on Si Filmetrics calibration sample: 1. Sample reflectance calibration region (go to 30,0) 2. Reference reflectance calibration region (go to 0,0) 3. (patterned sample region) One Si wafer available for reference reflectance calibration...
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Baseline warning Software issues a warning in case of important intensity difference after new baseline This can be due to • Lamp state (off or burnt, not warmed-up) • Objective used for last baseline Acknowledge if it makes sense!
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Point measurements • Navigate to the point of interest by means of • camera and r/theta controls (arrows), or • Go To… button (wafer center: 0,0) • Clic Measure Check goodness of fit (GOF)
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Measurement summary (History tab) • Basic statistics available in realtime on all stored data => Purge history • Export to text/spreadsheet...
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Wafer Mapping Click on Start Interacting with the map: • Left click: go to point • Right click: mark as invalid/interpolate from neighbours...
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