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Summary of Contents for Heidelberg Engineering MLA 150
- Page 1 MLA 150 User manual...
- Page 2 2. Design conversion 3. Troubleshooting main error/issues - to be added 4. Mask Fabrication (Backup VPG 740) - to be added 5. MLA 150 - 2 / Greyscale - to be added 6. Theory about the machine - to be added...
- Page 3 1.Exposing with MLA 150...
- Page 4 1. A – Start Level +1 1. log in on CAE 2. Start the menu → If not started yet, open the desktop applications (control and camera)
- Page 5 1.B – Setup job = input required • First be aware of this colour rule regarding boxes = input optional...
- Page 6 • • Create a new job or load one Double click on the orange box to chose → when done setting a job, you can save it your substrate : (please give it a specific name, jobs without one will be deleted) ▪...
- Page 7 Job layers Job parameters → Each layer is determined by : design + laser • Laser : choose between 375nm and 405nm parameters for the exposition (Dose and focus are according to recommendation set later in the process) • Laser power : 100% (filter is used for Greyscale) →...
- Page 8 Alignment Settings → Can be set only for non-FirstExposure layers → Load an alignment setting or create one : a) Name : to find the settings later in the list b) Top or Back side alignment (see next slide for more information about backside alignment) c) Position of the marks : enter the coordinates of your marks...
- Page 9 Alignment Settings – Information for backside alignment • The coordinates on the MLA always refer to the substrate side that is currently the upper surface (e.g. if an alignment mark is exposed at the position [X: +20 mm], the alignment mark will be at position [X: -20 mm] for the backside alignment.
- Page 10 1.C Expose → When your job is ready, select the layer to be exposed and click on → For wafer : 1. open the window 2. Place the guide 4. Activate the according to your Vacuum wafer size 5. Remove the 3.
- Page 11 1.C Expose → For small samples : • 1. Open the window 2. Place your sample in the centre of the chuck (best to align it in X and Y directions) 3. activate the vacuum 4. close the door → Follow screen instructions •...
- Page 12 Be aware that MLA-1 and MLA-2 have 1) Standard different Resist Tables a) Set a dose and focus according to the Resist Table (Desktop) or from your own experience b) The design can be tilted based on the rotation of your substrate measured by the machine c) Enable the exposition of bitmaps you set previously...
- Page 13 2) Standard with alignment a) Control if alignment positions are correct and edit if needed b) Click to start alignment procedure c) Overview and Low Res camera → move to your mark High Res → for the measurement d) Chose measurement mode : - Automatic : CrossAlignment or RectangleAlignment - Manual : ManualAlignment...
- Page 14 2) Standard with alignment e) For automatic detection, please make sure the feature to ). If y u ’ it, press on Resize/Maximize Detection Area and select a zone on the camera window or slide the sides of the rectangle. f) Measure: - automatic detection of the feature - manual selection of the position with the target tool...
- Page 15 Be aware that MLA-1 and MLA-2 have 2) Standard with alignment different Resist Tables g) Set a dose and focus according to the Resist Table (Desktop) or from your own experience h) Define which correction based on alignment you want to apply i) Enable the exposition of bitmaps you set previously j) Delay the exposure...
- Page 16 3) Series a) Choose parameters to test : dose / focus / dose + focus b) Define starting value, step and how many lines (# of fields) should contain the matrix c) Distance between 2 dyes in the matrix (stay orange if overlapping) d) Label at the bottom left of each dye containing Dose and Focus e) Delay the exposure [hour:minutes]...
- Page 17 Exposition information and position a) Estimated maximum time for exposition b) Position of exposed design. Hold-click on its side to move it on the substrate. c) When using the camera to find the appropriate position for exposition, press Set Zero at the desired position for the design centre →...
- Page 18 1.D End • If not automatically unloaded, your can restart your job in the main menu or expose a second layer • If you are done, click → When back to the main menu: 1) open the windows 2) deactivate the vacuum 3) get back your sample 4) close the windows →...
- Page 19 2. Design Conversion...
- Page 20 2. Convert - Goal : convert your design into a series of stripes than can be exposed by the MLA150 1. Copy your design into the corresponding file extension folder Allowed extension : .gds , .cif , .dxf (no capital letter) : …z …Z 0..9 _ ( ph + u d...
- Page 21 2. Convert your design - In the job setup/Design → click on GUI HIMT CONVERT will pop up → Press on the blank page icon to create a new job (or File/New Job) → Give a job name → Click on Add to load your design f y u ’...
- Page 22 Following instruction are for GDSII files. Procedures with DXF and CIF are relatively ’ h ff f y u h y d u . a) Select which cell from your design should be exposed b) Select how many layers you want to expose c) Select corresponding layers from your design...
- Page 23 a) Open the Viewer to check if your design/layer have been loaded correctly b) Expose mode : High quality = bigger overlap of the strip (≈ 1.5x slower) Fast = lower overlap of the stripe c) Invert : d) Expose windows = Position of the virtual rectangle fitting all your design →...
- Page 24 • You will be ask to save the job (no need to change the name) • Conversion will start and end → do not forget to click on Finish • If your job does not appear in the list, please Refresh it...
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