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Siemens SIMATIC RF 300 System Manual page 41

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Hydrochloric acid
Sulphur dioxide
Sulphuric acid
Hydrogen sulphide
Carbon tetrachloride
Toluene
Detergent
Plasticizer
J
Y
F
f
j
w.
c.s.
RF 300
System Manual, 05/2005, (4)J31069 D0166-U001-A1-7618, --
Resistant
Virtually resistant
Partially resistant
Less resistant
Not resistant
Aqueous solution
Cold saturated
4.5 Chemical resistance of the transponders
Concentration
10
Low
25
10
Low
High
Abbreviations
RF 300 system planning
20°C
60 °C
f
j
J
J
F
j
Y
j
J
J
J
J
J
Y
J
J
J
J
4-25

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